BF+2 implantation in predamaged Si with Ge+ or Si+ at doses lower than amorphization
- 1 April 1991
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 55 (1-4) , 550-554
- https://doi.org/10.1016/0168-583x(91)96228-d
Abstract
No abstract availableKeywords
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