Structure and properties of rf magnetron sputtered W films
Open Access
- 1 January 1990
- journal article
- Published by EDP Sciences in Microscopy Microanalysis Microstructures
- Vol. 1 (3) , 175-187
- https://doi.org/10.1051/mmm:0199000103017500
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Stresses, microstructure and resistivity of thin tungsten films deposited by RF magnetron sputteringApplied Surface Science, 1989
- The structure of ultrathin C/W and Si/W multilayers for high performance in soft x-ray opticsJournal of Applied Physics, 1989
- Characterization and Crystalline Structures of Tungsten Thin FilmsPhysica Status Solidi (a), 1983
- Tungsten metallization for LSI applicationsJournal of Vacuum Science and Technology, 1974
- Microstructure, growth, resistivity, and stresses in thin tungsten films deposited by rf sputteringJournal of Applied Physics, 1973