Deposition of microcrystalline silicon by electron beam excited plasma
- 31 December 1997
- journal article
- Published by Elsevier in Solar Energy Materials and Solar Cells
- Vol. 49 (1-4) , 81-88
- https://doi.org/10.1016/s0927-0248(97)00179-7
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Production of High-Density Plasmas in Electron-Beam-Excited Plasma DeviceJapanese Journal of Applied Physics, 1994
- New Etching System with a Large Diameter Using Electron Beam Excited PlasmaJapanese Journal of Applied Physics, 1992
- A model for the discharge kinetics and plasma chemistry during plasma enhanced chemical vapor deposition of amorphous siliconJournal of Applied Physics, 1988