Optical monitoring of the end point in thin film plasma etching
- 1 November 1983
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 109 (4) , 363-369
- https://doi.org/10.1016/0040-6090(83)90189-x
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
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- Optical Monitoring of the Etching of SiO2 and Si3 N 4 on Si by the Use of Grating Test PatternsJournal of the Electrochemical Society, 1978
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- Modelling of electroluminescent GaP diodes I (V) and L (V) characteristicsSolid-State Electronics, 1977
- Simple Optical Devices for Detection of Radiofrequency Oxygen Plasma Stripping of PhotoresistsApplied Spectroscopy, 1977