Cylinder Alignment in Annular Structures of Microphase-Separated Polystyrene-b-Poly(methyl methacrylate)
- 14 April 2000
- journal article
- letter
- Published by American Chemical Society (ACS) in Langmuir
- Vol. 16 (11) , 4766-4769
- https://doi.org/10.1021/la9914108
Abstract
No abstract availableThis publication has 16 references indexed in Scilit:
- Defect evolution in ultrathin films of polystyrene-block-polymethylmethacrylate diblock copolymers observed by atomic force microscopyThe Journal of Chemical Physics, 1998
- Layer by layer imaging of diblock copolymer films with a scanning electron microscopePolymer, 1998
- Silicon nitride membrane substrates for the investigation of local structure in polymer thin filmsPolymer, 1998
- Lithography with a mask of block copolymer microstructuresJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1998
- Selective Decoration of a Phase-Separated Diblock Copolymer with Thiol-Passivated Gold NanocrystalsLangmuir, 1998
- Morphology of Steps in Terraced Block Copolymer FilmsPhysical Review Letters, 1994
- Alignment of lamellar block copolymer microstructure in an electric field. 1. Alignment kineticsMacromolecules, 1993
- Effect of an electric field on block copolymer microstructureMacromolecules, 1991
- Block Copolymer Thermodynamics: Theory and ExperimentAnnual Review of Physical Chemistry, 1990
- Islands and holes on the free surface of thin diblock copolymer films. I. Characteristics of formation and growthJournal de Physique, 1990