Wafer chargeup study on the PR-80 high current ion implantation machine
- 1 February 1989
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 37-38, 572-575
- https://doi.org/10.1016/0168-583x(89)90249-8
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- A new computer designed faraday system for high current ion implantation systemsNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1987
- Charging studies in applied materials precision implant 9000 systemNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1987
- PR-80 high current ion implantation machineNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1987