In-situ high temperature X-ray diffraction study of Ni/Al2O3 interface reactions
- 31 December 1997
- journal article
- Published by Elsevier in Acta Materialia
- Vol. 45 (12) , 4917-4921
- https://doi.org/10.1016/s1359-6454(97)00188-2
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Development of X-ray Diffractometer for High Temperature Analysis.Materia Japan, 1995
- Designing structural defects to releive thermal stressActa Metallurgica et Materialia, 1992
- The thermodynamics of spinel interphase formation at diffusion-bonded Ni/Al2O3 interfacesActa Metallurgica et Materialia, 1991
- Electronic structure of metal-ceramic interfaces.ISIJ International, 1990
- Imaging plate for time-resolved x-ray measurements (invited)Review of Scientific Instruments, 1989
- Quantitative determination of the kinetics of the reaction of NiO and Al2O3 to NiAl2O4 by Rutherford backscatteringSurface and Interface Analysis, 1983
- Formation of NiAl2O4 by Solid State ReactionJournal of the American Ceramic Society, 1966
- Aluminum Ion Diffusion in Aluminum OxideThe Journal of Chemical Physics, 1962