High quality a-Si:H films and interfaces prepared by VHF plasma CVD
- 1 January 1991
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 137-138, 677-680
- https://doi.org/10.1016/s0022-3093(05)80211-x
Abstract
No abstract availableFunding Information
- Casio Science Promotion Foundation
- Ministry of Education, Culture, Sports, Science and Technology
- New Energy and Industrial Technology Development Organization
This publication has 2 references indexed in Scilit:
- Diagnostic Study of VHF Plasma and Deposition of Hydrogenated Amorphous Silicon FilmsJapanese Journal of Applied Physics, 1990
- Generation of Electron Cyclotron Resonance Plasma in the VHF BandJapanese Journal of Applied Physics, 1989