Surface scattering of x rays from InP (001) wafers
- 26 December 1994
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 65 (26) , 3317-3319
- https://doi.org/10.1063/1.112446
Abstract
We have studied the surface scattering of x rays from mechanical‐chemical polished InP (001) wafers with sulfur and/or iron doping. The scattering intensities in the scans transverse to the specular reflection rod were found to contain two components. A simple surface model was proposed to explain the experimental data. The results were also compared with those obtained from crystal truncation rod measurements.Keywords
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