The investigation of lateral damage effects of ion-implanted layers by back-scattering techniques
- 1 December 1973
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 19 (2) , 313-318
- https://doi.org/10.1016/0040-6090(73)90067-9
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Backscattering study on lateral spread of implanted ionsApplied Physics Letters, 1973
- A universal goniometer for channeling experimentsNuclear Instruments and Methods, 1972