Zur Stabilität der Entladungsbedingungen bei der Glimmpolymerisation von Hexamethyldisiloxan
- 1 January 1973
- journal article
- Published by Wiley in Contributions to Plasma Physics
- Vol. 13 (6) , 347-353
- https://doi.org/10.1002/ctpp.19730130603
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Organosilicon Films Formed by an RF Plasma Polymerization ProcessJournal of the Electrochemical Society, 1972
- Formation of supermolecular structures in thin polymer layersPublished by Walter de Gruyter GmbH ,1972
- Organic Reactions in Gas Discharges Leading to Polymer DepositsJournal of the Electrochemical Society, 1972