Improved uniformity of implanted dose by a compensated scan pattern generator
- 1 October 1981
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research
- Vol. 189 (1) , 311-318
- https://doi.org/10.1016/0029-554x(81)90160-9
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Beam scanning-electrostaticRadiation Effects, 1979
- Spatial dose uniformity monitor for electrically scanned ion beamReview of Scientific Instruments, 1978