Energy study of buckled micromachined beams for thin-film stress measurements applied to SiO2
- 30 November 1999
- journal article
- research article
- Published by IOP Publishing in Journal of Micromechanics and Microengineering
- Vol. 9 (4) , 414-421
- https://doi.org/10.1088/0960-1317/9/4/319
Abstract
Measurements of maximal deflection amplitude were carried out on arrays of clamped-clamped SiO2 microfabricated beams buckling under the effect of thin-film built-in compressive stress. The experimental deflection determination of these deflections yields the residual stress value in the SiO2 film. This proposal is confirmed by appropriate theory that considers the issue of microfabricated beam buckling from an energy point of view. In this model, the total potential energy stored in a buckled microbeam is computed and the residual stress value is given by considering the measured buckling maximal deflection and by making approximations about the shape of the microbeam deflection curve. The SiO2 film residual stress evaluated with the help of the energy method is in good agreement with values reported in the literature.Keywords
This publication has 17 references indexed in Scilit:
- On Nanobuckling of Monomolecular Layers Adhering to a SubstrateJournal of Applied Mechanics, 1999
- Buckling of polysilicon microbeams during sacrificial layer removalJournal of Micromechanics and Microengineering, 1998
- Comments on measuring thin-film stresses using bi-layer micromachined beamsJournal of Micromechanics and Microengineering, 1995
- Post buckling of micromachined beamsJournal of Micromechanics and Microengineering, 1994
- Characteristics of polysilicon resonant microbeamsSensors and Actuators A: Physical, 1992
- Novel microstructures for the i n s i t u measurement of mechanical properties of thin filmsJournal of Applied Physics, 1987
- A simple technique for the determination of mechanical strain in thin films with applications to polysiliconJournal of Applied Physics, 1985
- The lateral vibration of slightly bent slender beams subject to prescribed axial end displacementJournal of Sound and Vibration, 1980
- Local Stress Measurement in Thin Thermal SiO2 Films on Si SubstratesJournal of Applied Physics, 1972
- The tension of metallic films deposited by electrolysisProceedings of the Royal Society of London. Series A, Containing Papers of a Mathematical and Physical Character, 1909