Metal-induced crystallization of R.F. sputtered a-Si thin films
- 1 May 1976
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 34 (1) , 27-30
- https://doi.org/10.1016/0040-6090(76)90119-x
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- The crystallization of amorphous silicon filmsJournal of Non-Crystalline Solids, 1972
- Metal contact induced crystallization in films of amorphous silicon and germaniumJournal of Non-Crystalline Solids, 1972
- The influence of contact materials on the conduction crystallization temperature and electrical properties of amorphous germanium, silicon and boron filmsThin Solid Films, 1970
- Effect of Deposited Metals on the Crystallization Temperature of Amorphous Germanium FilmJapanese Journal of Applied Physics, 1969