Surface morphology and resistivity of aluminum oxide films prepared by plasma CVD combined with ion beam irradiation
- 1 January 1997
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 121 (1-4) , 125-128
- https://doi.org/10.1016/s0168-583x(96)00694-5
Abstract
No abstract availableThis publication has 1 reference indexed in Scilit:
- Preparation of Al2O3 films by a new CVD process combining plasma and accelerated ion beamsNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1996