Interactions of in atoms with partial dislocations cores in GaAs: 0.3% In

Abstract
It has been established that dislocation mobilities in GaAs are reduced by In doping. This reduction operates mainly on defects exhibiting at least one α (As core) partial dislocation. We discuss here the different interactions between In and α partials which can occur. We propose interstitial In incorporated on dangling bonds as responsible for the observed reduction in mobility. The role of temperature and stress is also discussed.