Epitaxial growth and surface structure of NiSi2{0 0 1} on Si{0 0 1}
- 28 February 1986
- journal article
- Published by Elsevier in Solid State Communications
- Vol. 57 (8) , 687-690
- https://doi.org/10.1016/0038-1098(86)90351-0
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
- Summary Abstract: Electronic structure investigation of epitaxial nickel silicides on Si(001)Journal of Vacuum Science & Technology A, 1984
- Formation and structure of epitaxial nickel silicide on Si{111}Physical Review B, 1983
- Formation of Ultrathin Single-Crystal Silicide Films on Si: Surface and Interfacial Stabilization of Si-NiEpitaxial StructuresPhysical Review Letters, 1983
- Diffusion-layer microstructure of Ni on Si(100)Physical Review B, 1982
- Interface and surface structure of epitaxial NiSi2 filmsApplied Physics Letters, 1981
- Silicon/metal silicide heterostructures grown by molecular beam epitaxyApplied Physics Letters, 1980
- Double heteroepitaxy in the Si (111)/CoSi2/Si structureApplied Physics Letters, 1980