Fabrication of 3.5 GHz surface acoustic wave filters by ion projection lithography
- 1 March 1992
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 17 (1-4) , 245-248
- https://doi.org/10.1016/0167-9317(92)90049-w
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- High-resolution technology for silicon-integrated surface acoustic wave devicesJournal of Vacuum Science & Technology B, 1989
- Fabrication of surface acoustic wave devices by using x-ray lithographyJournal of Vacuum Science & Technology B, 1989
- Masked ion beam resist exposure using grid support stencil masksJournal of Vacuum Science & Technology B, 1985