Polyhedral Oligomeric Silsesquioxane Containing Copolymers for Negative‐Type Photoresists
- 22 September 2006
- journal article
- research article
- Published by Wiley in Macromolecular Rapid Communications
- Vol. 27 (18) , 1550-1555
- https://doi.org/10.1002/marc.200600363
Abstract
No abstract availableKeywords
This publication has 27 references indexed in Scilit:
- Polyhedral Oligomeric Silsesquioxane (POSS) Nanoscale Reinforcement of Thermosetting Resin from Benzoxazine and BisoxazolineMacromolecular Rapid Communications, 2005
- Wettability of Polyhedral Oligomeric Silsesquioxane Nanostructured Polymer SurfacesMacromolecular Rapid Communications, 2005
- Pressure, the Critical Factor Governing Final Microstructures of Cured Rubber/Clay NanocompositesMacromolecular Rapid Communications, 2005
- A Novel Photocrosslinkable Polyhedral Oligomeric Silsesquioxane and Its Nanocomposites with Poly(vinyl cinnamate)Chemistry of Materials, 2004
- Epoxy Networks Containing Large Mass Fractions of a Monofunctional Polyhedral Oligomeric Silsesquioxane (POSS)Macromolecules, 2003
- High sensitivity nanocomposite resists for EUV lithographyMicroelectronic Engineering, 2003
- Incorporation of polyhedral oligosilsesquioxane in chemically amplified resists to improve their reactive ion etching resistanceJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2001
- Novel Positive-Tone Chemically Amplified Resists with Photoacid Generator in the Polymer ChainsAdvanced Materials, 2001
- Hybrid Organic−Inorganic Thermoplastics: Styryl-Based Polyhedral Oligomeric Silsesquioxane PolymersMacromolecules, 1996
- Linear Hybrid Polymer Building Blocks: Methacrylate-Functionalized Polyhedral Oligomeric Silsesquioxane Monomers and PolymersMacromolecules, 1995