Al2O3 coatings against high temperature corrosion deposited by metal-organic low pressure chemical vapour deposition
- 1 February 1994
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 239 (1) , 31-36
- https://doi.org/10.1016/0040-6090(94)90104-x
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Cracking and delamination of metal organic vapour and deposited alumina and silica filmsMaterials Science and Engineering: A, 1993
- Corrosion resistant coatings (Al2O3) produced by metal organic chemical vapour deposition using aluminium-tri-sec-butoxideThin Solid Films, 1993
- Stress and Structural Relaxation in Metallo-Organic Chemical Vapor Deposited SiO2 FilmsJapanese Journal of Applied Physics, 1991
- Decomposition Chemistry of TetraethoxysilaneJournal of the American Ceramic Society, 1989
- A study of aluminum oxide thin films prepared by atmospheric-pressure chemical vapor deposition from trimethylaluminum + oxygen and/or nitrous oxideJournal of Electronic Materials, 1988
- Processes in interfacial zones during chemical vapour deposition: Aspects of kinetics, mechanisms, adhesion and substrate atom transportThin Solid Films, 1985
- Chemical Vapor Deposition of Al2 O 3 Thin Films under Reduced PressuresJournal of the Electrochemical Society, 1985
- Chemical Vapor Deposition of Polycrystalline Al2O3Journal of the American Ceramic Society, 1970
- Deposition and Properties of Aluminum Oxide Obtained by Pyrolytic Decomposition of an Aluminum AlkoxideJournal of the Electrochemical Society, 1967