Sputtering of amorphous Co-Zr and Co-Hf films with soft magnetic properties
- 1 April 1982
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 53 (4) , 3156-3160
- https://doi.org/10.1063/1.331013
Abstract
Amorphous Co‐Zr and Co‐Hf films produced by sputtering have been investigated. The fundamental magnetic properties, sputtering conditions for the soft magnetic properties, and annealing to obtain high permeability films have been studied. The saturation magnetization, magnetostriction of the sputteredfilms, and range of composition of amorphous phase have been determined. Sensitive dependence of the soft magnetic properties on Ar gas pressure has been found. Sputtering in low Ar gas pressure suppresses the formation of microcrystals in the amorphous matrix and columnar structure in the films which deteriorates the soft magnetic properties. High permeability films have been obtained by annealing and their thermal stability was studied.This publication has 7 references indexed in Scilit:
- Properties of Amorphous Iron-Metalloid Thin FilmsJapanese Journal of Applied Physics, 1981
- Amorphous magnetic alloys of cobalt-titaniumJournal of Applied Physics, 1981
- Sputtering of FeCo-B amorphous films with soft magnetic propertiesIEEE Transactions on Magnetics, 1981
- Non-magnetostrictive amorphous soft magnetic thin film material of high magnetizationJournal of Applied Physics, 1979
- Magnetic thin film inductors for integrated circuit applicationsIEEE Transactions on Magnetics, 1979
- Magnetic properties and thermal stability of Fe-B amorphous filmsJournal of Applied Physics, 1979
- Low-coercivity amorphous magnetic alloy filmsJournal of Applied Physics, 1978