Correlation between the density of TiO2 films and their properties
- 30 September 1996
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 286 (1-2) , 32-34
- https://doi.org/10.1016/s0040-6090(96)08848-7
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Density of thin TiO2 filmsNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1996
- Comparative photothermal study of reactive low-voltage ion-plated and electron-beam-evaporated TiO_2 thin filmsApplied Optics, 1994
- Density, thickness and interface roughness of SiO2, TiO2 and Ta2O5 films on BK-7 glasses analyzed by x-ray reflectionThin Solid Films, 1993
- Correlation of hydrogen content with properties of oxidic thin filmsSurface and Interface Analysis, 1992
- Plasma impulse chemical vapour deposition—a novel technique for the production of high power laser mirrorsMaterials Science and Engineering: A, 1991
- Intrinsic stress in sputtered thin filmsJournal of Vacuum Science & Technology A, 1991
- Structural, optical and electronical properties of mixed dielectric filmsVacuum, 1990
- Concentration profiles of hydrogen in technical oxidic thin films and multilayer systemsAnalytical and Bioanalytical Chemistry, 1989
- Algorithms for the rapid simulation of Rutherford backscattering spectraNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985