Density, thickness and interface roughness of SiO2, TiO2 and Ta2O5 films on BK-7 glasses analyzed by x-ray reflection
- 1 August 1993
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 230 (2) , 191-198
- https://doi.org/10.1016/0040-6090(93)90514-p
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Determination of the dispersive correction f'(E) to the atomic form factor from X-ray reflectionActa Crystallographica Section A Foundations of Crystallography, 1992
- Correlation of hydrogen content with properties of oxidic thin filmsSurface and Interface Analysis, 1992
- Investigations of TiO2 films deposited by different techniquesThin Solid Films, 1991
- Corrections to tabulated anomalous-scattering factorsActa Crystallographica Section A Foundations of Crystallography, 1990
- Characterization of Ta2O5 layers by electron spectroscopy for chemical analysis rutherford backscattering spectrometry, nuclear reaction analysis and optical methodsThin Solid Films, 1989
- Nuclear reaction analysis of hydrogen in optically active coatings on glassNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1989
- Technical note: Comparison of film density, stoichiometry, optical and electrical properties of thin metal oxide films produced by reactive d.c. magnetron sputtering and electron beam evaporation techniquesSurface and Coatings Technology, 1987
- Calculation of anomalous scattering factors at arbitrary wavelengthsJournal of Applied Crystallography, 1983
- Caractérisation des surfaces par réflexion rasante de rayons X. Application à l'étude du polissage de quelques verres silicatesRevue de Physique Appliquée, 1980
- Surface Studies of Solids by Total Reflection of X-RaysPhysical Review B, 1954