In-situ diagnostics for plasma surface processing
- 1 June 1993
- journal article
- Published by Springer Nature in Applied Physics A
- Vol. 56 (6) , 479-492
- https://doi.org/10.1007/bf00331399
Abstract
No abstract availableKeywords
This publication has 40 references indexed in Scilit:
- Depolarization Rayleigh scattering as a means of molecular concentration determination in plasmasPhysical Review Letters, 1992
- A combined Thomson–Rayleigh scattering diagnostic using an intensified photodiode arrayReview of Scientific Instruments, 1992
- Measurement of electron densities by a microwave cavity method in 13.56-MHz RF plasmas of Ar, CF4, C2F6, and CHF3Plasma Chemistry and Plasma Processing, 1991
- A comparison of a passive (filtered) and an active (driven) probe for RF plasma diagnosticsMeasurement Science and Technology, 1991
- The continuum emission of an arc plasmaJournal of Quantitative Spectroscopy and Radiative Transfer, 1991
- An electrostatic probe technique for RF plasmaJournal of Physics E: Scientific Instruments, 1987
- A mass spectrometric diagnostic of C2F6 and CHF 3 plasmas during etching of SiO2 and SiRevue de Physique Appliquée, 1985
- Microstructural Information From Optical Properties In Semiconductor TechnologyPublished by SPIE-Intl Soc Optical Eng ,1981
- Limitations of the Microwave Cavity Method of Measuring Electron Densities in a PlasmaPhysical Review B, 1957
- I.Energy balance, electron temperature, and voltage gradient in the positive column in mixtures ofNavapour withNe, He,andArJournal of Computers in Education, 1934