Sputtered SiO2 deposited over a step
- 1 May 1970
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 5 (5) , 355-364
- https://doi.org/10.1016/0040-6090(70)90107-0
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
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- Distribution of Material Sputtered from a Disk ElectrodeJournal of Vacuum Science and Technology, 1969
- RF Sputter Etching—A Universal EtchJournal of the Electrochemical Society, 1969
- Re-emission Coefficients of Si and SiO2 Films Deposited through rf and dc SputteringJournal of Applied Physics, 1967
- Dielectric Thin Films through rf SputteringJournal of Applied Physics, 1966
- Structural Evaluation of Silicon Oxide FilmsJournal of the Electrochemical Society, 1965
- Sputtering of Dielectrics by High-Frequency FieldsJournal of Applied Physics, 1962