Mechanism of CF Polymer Film Deposition through High-Aspect-Ratio SiO2 Holes
- 1 December 1994
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 33 (12A) , L1717
- https://doi.org/10.1143/jjap.33.l1717
Abstract
The deposition of polymer films through SiO2 microholes was studied by using a multichannel capillary array (MCA). CHF3 plasma polymer films were deposited on Si substrates through an MCA (hole diameter 10 µm, aspect ratio 40) made of lead glass, and X-ray photoelectron spectroscopy was used to analyze the films. The deposition rate under MCA was higher than those of flat surfaces. Pb from the MCA material was detected in the film deposited through the MCA, and CF polymers deposited through the MCA were more carbon rich than those deposited outside the MCA. These results suggest that polymers reach the bottom of the hole by being etched from and redeposited on the sidewall.Keywords
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