Influence of phase shift on pattern transfer in x-ray lithography
- 31 December 1987
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 6 (1-4) , 265-271
- https://doi.org/10.1016/0167-9317(87)90048-7
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Fresnel Phase Effects For X-Ray MicrolithographyPublished by SPIE-Intl Soc Optical Eng ,1986
- Resolution limits in x-ray lithography calculated by means of x-ray lithography simulator X M A SJournal of Vacuum Science & Technology B, 1986
- High contrast synchrotron x-ray lithography by means of silicon based masks and magnesium beam windowsMicroelectronic Engineering, 1985
- Low-energy x-ray interaction coefficients: Photoabsorption, scattering, and reflectionAtomic Data and Nuclear Data Tables, 1982
- Computer simulations of resist profiles in x-ray lithographyJournal of Vacuum Science and Technology, 1981