A model for development of orientation of vapour deposits
- 1 December 1989
- journal article
- Published by Springer Nature in Journal of Materials Science
- Vol. 24 (12) , 4375-4378
- https://doi.org/10.1007/bf00544515
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- Preferred orientation of ZnO films controlled by r.f. sputteringThin Solid Films, 1982
- Structures and properties of vacuum vapor deposited coatings on steel substratesJournal of Vacuum Science and Technology, 1974
- Characterization of silver coatings deposited from a hollow cathode sourceJournal of Vacuum Science and Technology, 1974
- Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatingsJournal of Vacuum Science and Technology, 1974
- The orientation of vapour depositsPhilosophical Magazine, 1962