Influence of gas phase parameters on the deposition kinetics and morphology of thin diamond films deposited by HFCVD and MWCVD technique
- 25 March 1992
- journal article
- Published by Elsevier in Diamond and Related Materials
- Vol. 1 (2-4) , 164-167
- https://doi.org/10.1016/0925-9635(92)90018-j
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
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