Surface Wave Plasma Abatement of CHF3 and CF4 Containing Semiconductor Process Emissions
- 14 April 1999
- journal article
- research article
- Published by American Chemical Society (ACS) in Environmental Science & Technology
- Vol. 33 (11) , 1892-1897
- https://doi.org/10.1021/es9805472
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Innovative Surface Wave Plasma Reactor Technique for PFC AbatementEnvironmental Science & Technology, 1998
- A Synthetic Approach to RF Plasma Modeling Verified by Experiments: Demonstration of a Predictive and Complete Plasma SimulatorJapanese Journal of Applied Physics, 1997
- Electron Interactions with CHF3Journal of Physical and Chemical Reference Data, 1997
- Electron Interactions with CF4Journal of Physical and Chemical Reference Data, 1996
- Hazardous Air Emissions from IncinerationPublished by Springer Nature ,1985