Model for the quasineutral region capacitance of p/n junction devices
- 15 June 1997
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 81 (12) , 8074-8078
- https://doi.org/10.1063/1.365414
Abstract
The capacitance associated with free-carrier charge storage in the quasineutral region is a primary factor in limiting the switching speed of junction devices. This capacitance has been conventionally modeled using assumptions such as low-level injection, nondegeneracy, complete impurity ionization, and no space-charge region thickness modulation. These assumptions can give rise to a large error in device modeling, particularly for modern devices with very small geometry and high bias conditions. In this article, a comprehensive quasineutral region capacitance model including relevant device physics is developed. Comparisons between the present and conventional models are made, and the effects of using these two different models on the total capacitance of junction diode are also investigated.
This publication has 7 references indexed in Scilit:
- A Comprehensive Study of High-Level Free-Carrier Injection in Bipolar Junction TransistorsJapanese Journal of Applied Physics, 1996
- Relative Errors of Free-Carrier Density at Different Temperatures Calculated from Approximations for the Fermi-Dirac IntegralJapanese Journal of Applied Physics, 1995
- High-level injection in quasi-neutral region of n/p junction devices: Numerical results and empirical modelJournal of Applied Physics, 1995
- Analytical modeling of polycrystalline silicon emitter bipolar transistors under high-level injectionSolid-State Electronics, 1994
- Analytical base transit time model for high-injection regionsSolid-State Electronics, 1994
- An extended ambipolar model: Formulation, analytical investigations, and application to photocurrent modelingJournal of Applied Physics, 1991
- The Transport of Added Current Carriers in a Homogeneous SemiconductorPhysical Review B, 1953