In situ transmission electron microscopy studies of silicide-mediated crystallization of amorphous silicon

Abstract
The silicide‐mediated phase transformation of amorphous to crystalline silicon was observed in situ in the transmission electron microscope. Crystallization of nickel‐implanted amorphous silicon occurred at ∼500 °C. Nickel disilicide precipitates were observed to migrate through an amorphous Si film leaving a trail of crystalline Si. Growth occurred parallel to 〈111〉 directions. High resolution electron microscopy revealed an epitaxial NiSi2/Si(111) interface which was Type A. A diffusion‐controlled mechanism for the enhanced crystallization rate was determined.