TFT Performance - Material Quality Correlation for a-Si:H Deposited at high Rates
- 1 January 1995
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
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- High-rate deposition of amorphous hydrogenated silicon: effect of plasma excitation frequencyElectronics Letters, 1987
- Density of the gap states in undoped and doped glow discharge a-Si:HSolar Energy Materials, 1983
- Optical Properties and Electronic Structure of Amorphous GermaniumPhysica Status Solidi (b), 1966