Formation of molybdenum nitride films by ion beam and vapor deposition method
- 1 January 1987
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 19-20, 791-796
- https://doi.org/10.1016/s0168-583x(87)80159-3
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Coating Films of Titanium Nitride Prepared by Ion and Vapor Deposition MethodJapanese Journal of Applied Physics, 1985
- Electronic structures ofB1MoN, fccN, and hexagonal MoNPhysical Review B, 1985
- Nitride film formation by ion and vapour depositionNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985
- Electronic properties of transition-metal nitrides: The group-V and group-VI nitrides VN, NbN, TaN, CrN, MoN, and WNPhysical Review B, 1985
- A new machine for film formation by ion and vapour depositionNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985
- Formation of Cubic Boron Nitride Films by Boron Evaporation and Nitrogen Ion Beam BombardmentJapanese Journal of Applied Physics, 1983
- B1-type MoN, a possible high Tc superconductorSolid State Communications, 1983
- Preparation and superconducting properties of MoN and MoC in form of wiresIEEE Transactions on Magnetics, 1981