MOS Area Sensor: Part II - Low-Noise MOS Area Sensor with Antiblooming Photodiodes
- 1 August 1980
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Journal of Solid-State Circuits
- Vol. 15 (4) , 747-752
- https://doi.org/10.1109/jssc.1980.1051464
Abstract
The development of a high-sensitivity 320 X 244 element MOS area sensor and a novel fixed pattern noise (FPN) suppressing circuit are reported in this paper. The new device incorporates p/sup +/-n/sup +/ high-C photodiodes and double-diffused sense lines. The p/sup +/-n/sup +/ high-C photodiodes provide a large dynamic range and a large saturation signat of 1.4 /spl mu/A with 6-1x W-lamp illumination. The double-diffused sense lines are introduced to vastly improve blooming characteristics, making use of a built-in potential barrier. FPN is proved to stem mainly from inversion charge variations through horizontal switching MOS gate capacitances. A simple high-performance FPN suppressing circuit is proposed which realizes high signal-to-noise (S/N) ratios of more than 68 dB at saturation. The new sensor is tested in a high-sensitivity black-and-white VTR hand-held camera and will find broad applications.Keywords
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