Growth of copper-nickel alloy films suitable for use as substrates
- 1 August 1972
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 43 (8) , 3581-3583
- https://doi.org/10.1063/1.1661761
Abstract
The structure of copper‐nickel alloy filmsgrown via simultaneous deposition on air‐cleaved rocksalt has been studied by transmission electron microscopy. The epitaxial temperature of the alloy films was determined as a function of composition. Alloy filmsgrown and annealed at 350 °C exhibited a relatively high density (∼ 1 × 1010/cm2) of twins. The twin density could be reduced to ∼ 1 × 108/cm2 through growth of the alloy film at 540 °C followed by a 10‐min anneal at this temperature.This publication has 6 references indexed in Scilit:
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