Visible Luminescence Induced by Si-Ion Implantation into Si Single Crystals Covered with a Thin SiO2Layer

Abstract
An investigation of Si ion implantation into Si single crystals covered with a SiO2layer of various thicknesses (1000–3000 Å) was conducted and new characteristic luminescence bands were observed. A visible band that peaked around 1.89 or 2.0 eV was observed from the as-implanted samples. After high temperature post annealing, a visible band located in the range of 1.7 eV was detected. Interestingly, a new luminescence band around 1.5 eV was observed, for the first time, in a sample covered with a 3000 Å SiO2layer, after high dose implantation and annealing. We report, in this letter, the experimental results and a brief discussion concerning the various possible mechanisms responsible for the observed luminescence bands.