A Blister Test for Adhesion of Polymer Films to SiO2
- 1 November 1983
- journal article
- research article
- Published by Taylor & Francis in The Journal of Adhesion
- Vol. 16 (2) , 115-125
- https://doi.org/10.1080/00218468308074909
Abstract
Films of polystyrene or polymethyl methacrylate were cast on oxidized silicon substrates, then detached by the application of gas or water pressure from the back side of the film through a hole in the substrate. Critical detachment pressures showed good repeatability and could be used to calculate the work of adhesion. For polystyrene on a hydrophilic silica in the presence of water, the apparent work of adhesion is 78 mJ/m2. Other polymer/ substrate combinations gave meaningful variations in detachment pressure.Keywords
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