Depth-profiling of Cu-Ni sandwich samples by secondary ion mass spectrometry
- 1 December 1975
- journal article
- Published by Springer Nature in Applied Physics A
- Vol. 8 (4) , 359-360
- https://doi.org/10.1007/bf00898370
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Surface of Iron Bombarded with Argon and Oxygen IonsJapanese Journal of Applied Physics, 1974
- A mechanism of surface micro-roughening by ion bombardmentJournal of Materials Science, 1973
- Effect of oxygen on the sputtering of aluminium targets bombarded with argon ionsInternational Journal of Mass Spectrometry and Ion Physics, 1973
- Influence of channelling on secondary ion emission yieldsRadiation Effects, 1973
- A necessary condition for the appearance of damage-induced surface-topography during particle bombardmentRadiation Effects, 1973
- The collection of ions implanted in semiconductors. II. range distributions derived from collection and sputter-etch curvesRadiation Effects, 1972
- Design of a combined ion and electron microprobe apparatusInternational Journal of Mass Spectrometry and Ion Physics, 1971
- Cone Formation on Metal Targets during SputteringJournal of Applied Physics, 1971
- Ion Sorption in the Presence of SputteringProceedings of the Physical Society, 1962
- ?Neue Untersuchungen ber die Kathodenzerst ubung der Glimmentladung.?The European Physical Journal A, 1942