Preparation of x-ray lithography masks using a tungsten reactive ion etching process
- 1 August 1982
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 41 (3) , 247-248
- https://doi.org/10.1063/1.93483
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- High-resolution pattern definition in tungstenApplied Physics Letters, 1981
- Colorless, transparent, c-oriented aluminum nitride films grown at low temperature by a modified sputter gunApplied Physics Letters, 1981
- Polyimide membrane x-ray lithography masks—Fabrication and distortion measurementsJournal of Vacuum Science and Technology, 1978