Quantum effects in Si n-MOS inversion layer at high substrate concentration
- 1 December 1990
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 33 (12) , 1581-1585
- https://doi.org/10.1016/0038-1101(90)90138-5
Abstract
No abstract availableThis publication has 12 references indexed in Scilit:
- A mobility model for submicrometer MOSFET device simulationsIEEE Electron Device Letters, 1987
- Self-consistent calculation of electron and hole inversion charges at silicon–silicon dioxide interfacesJournal of Applied Physics, 1986
- Semi-empirical equations for electron velocity in silicon: Part II—MOS inversion layerIEEE Transactions on Electron Devices, 1983
- Fully macroscopic description of electrical conduction in metal-insulator-semiconductor structuresPhysical Review B, 1983
- Model for modulation doped field effect transistorIEEE Electron Device Letters, 1982
- Fully macroscopic description of bounded semiconductors with an application to the Si-SiinterfacePhysical Review B, 1980
- Electron mobility in inversion and accumulation layers on thermally oxidized silicon surfacesIEEE Transactions on Electron Devices, 1980
- Measurements of bandgap narrowing in Si bipolar transistorsSolid-State Electronics, 1976
- Self-Consistent Results for-Type Si Inversion LayersPhysical Review B, 1972
- Properties of Semiconductor Surface Inversion Layers in the Electric Quantum LimitPhysical Review B, 1967