Effect of Annealing in Various Gases on the Bulk Lifetime of Germanium
- 1 February 1957
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 28 (2) , 271-272
- https://doi.org/10.1063/1.1722722
Abstract
High resistivity germanium single crystals were annealed at 500°C in various gases. For an oxygen atmosphere with a trace of water vapor present, the bulk lifetime more than doubled, then decreased to below the initial value. For dry oxygen and for nitrogen, helium, hydrogen, or argon in the presence of water vapor, the lifetime first remained constant, and then decreased. Prolonged annealing in dry helium did not affect the lifetime. The data have been interpreted in terms of a ``leaching out'' of an impurity recombination center by a water catalyzed surface oxidation, and a simultaneous formation of an oxide of germanium which diffuses into the bulk and on precipitation acts as a recombination center.This publication has 8 references indexed in Scilit:
- Effect of Dislocations on the Minority Carrier Lifetime in SemiconductorsPhysical Review B, 1956
- Electron Voltaic Study of Electron Bombardment Damage and its Thresholds in Ge and SiPhysical Review B, 1955
- Measurement of Carrier Lifetimes in Germanium and SiliconJournal of Applied Physics, 1955
- Dislocations in Plastically Deformed GermaniumPhysical Review B, 1954
- Effect of Nickel and Copper Impurities on the Recombination of Holes and Electrons in GermaniumThe Journal of Physical Chemistry, 1953
- Diffusion of Lithium into Germanium and SiliconPhysical Review B, 1953
- Temporary Traps in Silicon and GermaniumPhysical Review B, 1953
- The Kinetics of the Reaction of Germanium and OxygenJournal of the American Chemical Society, 1951