Gas-assisted etching with focused ion beam technology
- 31 March 1994
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 24 (1-4) , 43-50
- https://doi.org/10.1016/0167-9317(94)90053-1
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- FIB endpoint detection and depth resolutionMicroelectronic Engineering, 1993