A review of thin-film aluminide formation
- 31 December 1990
- journal article
- review article
- Published by Elsevier in Materials Science Reports
- Vol. 5 (1) , 1-44
- https://doi.org/10.1016/s0920-2307(05)80005-2
Abstract
No abstract availableKeywords
This publication has 85 references indexed in Scilit:
- Simultaneous growth of a crystalline phase and a quasicrystalline phase in lateral Al–Pd diffusion couplesPhilosophical Magazine Letters, 1990
- Solid-state amorphization in Al-Pt multilayers by low-temperature annealingPhysical Review B, 1989
- Pt2Al3 formation on evaporated and large-grained Al substratesPhysica Status Solidi (a), 1988
- Growth kinetics of NiAl3 formation on large-grained 〈Al〉 substratesMaterials Letters, 1987
- Diffusion markers in thin-film VAl3, Co2Al9, CrAl7, MoAl12, and Ni3Al formationJournal of Materials Research, 1986
- Interdiffusion and precipitation in Al[sbnd]Hf thin-film couplesPhilosophical Magazine A, 1986
- Reaction of Al/Mo thin filmsJournal of Materials Science, 1984
- Thermal stability of diffusion barriers for aluminum alloy/platinum silicide contactsJournal of Vacuum Science & Technology A, 1983
- Anomalous growth of HfAl3 in thin filmsJournal of Vacuum Science and Technology, 1977
- Behavior of various silicon Schottky barrier diodes under heat treatmentSolid-State Electronics, 1976