Pt2Al3 formation on evaporated and large-grained Al substrates
- 16 December 1988
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 110 (2) , 509-514
- https://doi.org/10.1002/pssa.2211100223
Abstract
No abstract availableKeywords
This publication has 13 references indexed in Scilit:
- Diffusion of silicon in Pd2Si during silicide formationJournal of Applied Physics, 1988
- Study of the initial aluminide phase growth in Al/Pt couplesThin Solid Films, 1987
- Interfacial reaction-induced morphological instabilities in thin Al/Pt and Al/Pd filmsJournal of Materials Research, 1987
- Kinetics of NiAl3 growth induced by steady-state thermal annealing at the Ni-〈Al〉 interfaceJournal of Applied Physics, 1987
- Phase formation and dissociation in the thin-film Pt/Al systemJournal of Applied Physics, 1987
- Void formation in thin Al filmsApplied Physics Letters, 1987
- Diffusion markers in Al/metal thin-film reactionsNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1986
- Phase formation by ion beam mixing in Ni/Al, Pd/Al, and Pt/Al bilayersApplied Physics Letters, 1983
- Thin-film interaction in aluminum and platinumJournal of Applied Physics, 1976
- Kinetics of compound formation in thin film couples of Al and transition metalsJournal of Vacuum Science and Technology, 1976