Ion beam studies part V: The computer simulation of composite ion implantation profiles
- 1 July 1977
- journal article
- Published by Elsevier in Nuclear Instruments and Methods
- Vol. 144 (2) , 175-181
- https://doi.org/10.1016/0029-554x(77)90107-0
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Range parameters of heavy ions at 10 and 35 keV in siliconPhysics Letters A, 1975
- Summation of Gaussians for ion-implantation profile controlElectronics Letters, 1969