Deposition of a-Si:H Films with a Remote Hydrogen Plasma
- 1 January 1989
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Hydrogen incorporation in undoped microcrystalline siliconApplied Physics Letters, 1988
- Dependence of Hydrogen Incorporation in Undoped a-Si:H and µc-Si:H on Hydrogen Dilution During PecvdMRS Proceedings, 1988
- Growth of a-Si:H Films by Remote Plasma Enhanced CVD (RPECVD)MRS Proceedings, 1988
- Thermal-equilibrium processes in amorphous siliconPhysical Review B, 1987
- Growth of Amorphous and Crystalline Silicon by HR-CVD (Hydrogen Radical Enhanced CVD)MRS Proceedings, 1987
- Electronic transport in doped amorphous siliconPhysical Review B, 1986