Silicon deposition from SiCl4 in a cold r.f. plasma: The effect of doping gases on deposition rates, chlorine content and the morphology of the films
- 1 November 1984
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 121 (2) , 135-141
- https://doi.org/10.1016/0040-6090(84)90235-9
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- On the Enhancement of Silicon Chemical Vapor Deposition Rates at Low TemperaturesJournal of the Electrochemical Society, 1976
- The Kinetics of Silicon Deposition on Silicon by Pyrolysis of SilaneJournal of the Electrochemical Society, 1974
- Growth and Characterization of Polycrystalline SiliconJournal of the Electrochemical Society, 1973
- Low Temperature Chemical Vapor Deposition of Boron Doped Silicon FilmsJournal of the Electrochemical Society, 1973