Real time control of the growth of silicon alloy multilayers by multiwavelength ellipsometry
- 1 December 1996
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 290-291, 46-50
- https://doi.org/10.1016/s0040-6090(96)09175-4
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Real time monitoring of the growth of transparent thin films by spectroscopic ellipsometryReview of Scientific Instruments, 1996
- Optical characterization of continuous compositional gradients in thin films by real time spectroscopic ellipsometryApplied Physics Letters, 1995
- Real time monitoring of the growth of transparent thin films by spectroscopic ellipsometryApplied Physics Letters, 1995
- In situ optical multichannel spectrometer systemPublished by SPIE-Intl Soc Optical Eng ,1994
- Gradient index film fabrication using optical control techniquesPublished by SPIE-Intl Soc Optical Eng ,1993
- Real-time in situ ellipsometric control of antireflection coatings for semiconductor laser amplifiers using SiOxJournal of Vacuum Science & Technology A, 1993
- Virtual interface method for in situ ellipsometry of films grown on unknown substratesJournal of Vacuum Science & Technology A, 1993
- Minimal-data approaches for determining outer-layer dielectric responses of films from kinetic reflectometric and ellipsometric measurementsJournal of the Optical Society of America A, 1993
- Insitu spectral ellipsometry for real-time measurement and controlApplied Surface Science, 1993
- Deposition error compensation for optical multilayer coatings I Theoretical descriptionApplied Optics, 1992