Optimized ion beam raster for SIMS sputter depth profiling
- 1 June 1989
- journal article
- research article
- Published by Wiley in Surface and Interface Analysis
- Vol. 14 (6-7) , 302-306
- https://doi.org/10.1002/sia.740140606
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- SIMS analysis, under caesium bombardment, of Si in GaAs/(Al, Ga) as superlattices: Detection limit and depth resolutionSurface and Interface Analysis, 1988
- Quantifying the effects of uneven etching during the SIMS analysis of periodic doping structures grown by silicon MBESurface and Interface Analysis, 1988